汉译英急

发布网友发布时间：2022-05-22 02:16

共1个回答

热心网友时间：2023-11-27 03:03

According to the existing domestic and international plane sputtering of the various sources of analysis and comparison with magnetron sputtering source of the main features, through discussions and planar magnetron sputtering target distribution of the magnetic field and deposited film thickness uniformity of approach was , To draw in the project magnetron sputtering source of the structure, eventually determined to ensure that good of the deposition and thickness uniformity of the sputtering source.

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汉译英 急

汉译英急